A Calculation Method of X-Ray Emitted Intensity in Multi-Layer Films by Monte Carlo Simulation

Authors

Yen-cai Ho, Shanghai Institute of Ceramics
Jia-guang Chen, Shanghai Baoshan Steel Works
Xin-lei Wang, Shanghai Institute of Ceramics

Abstract

A calculation method of X-ray emitted intensity in multi-layer films is proposed in this paper. The method is based on the work developed by us: (1) a simplified physical model of electron scattering and Monte Carlo evaluations in a single medium and in multi-layer media and (2) the theories and the formulae for excitation, absorption and fluorescence of characteristic X-rays. The intensity ratio of X-rays for the known thickness films, Au/Cu/Si and Cr/Ni/Si, were calculated at 20, 25 and 30 keV. Calculated results are compared with experimental values of electron microprobe analysis for the multi-layer film specimens, and the correspondence is excellent. The work lays foundations for X-ray quantitative microanalysis of multi-layer specimens.

Recommended Citation

Ho, Yen-cai; Chen, Jia-guang; and Wang, Xin-lei (1989) "A Calculation Method of X-Ray Emitted Intensity in Multi-Layer Films by Monte Carlo Simulation," Scanning Microscopy: Vol. 3: No. 3, Article 4.
Available at: https://digitalcommons.usu.edu/microscopy/vol3/iss3/4