Document Type

Article

Journal/Book Title/Conference

Rev. Sci. Instrum.

Volume

63

Location

3835-3841

Publication Date

1992

DOI

10.1063/1.1143279

Abstract

An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag( 111) surface.

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