All Physics Faculty Publications

Document Type

Article

Journal/Book Title/Conference

Journal of Applied Physics

Volume

88

Issue

11

Publication Date

2000

First Page

6954

Last Page

6957

DOI

10.1063/1.131604

Abstract

We demonstrate that ultrafast pump–probe reflectivity measurements from bulk Si samples using a Ti:sapphire femtosecond oscillator (λ=800 nm) can be used to measure the Si surface recombination velocity. The technique is sensitive to recombination velocities greater than ∼104 cm s−1

Comments

Published by American Institute of Physics in Journal of Applied Physics. Publisher PDF is available for download through link above.

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