Monte Carlo Simulation of Secondary Electron Emission From Thin Film/Substrate Targets

Authors

K. Murata, Osaka Prefecture UniversityFollow
M. Yasuda, Osaka Prefecture University
H. Kawata, Osaka Prefecture University

Abstract

We have developed a Monte Carlo simulation model of secondary electron emission from thin film/substrate samples, taking into consideration their exact boundary condition. First, the validity of the model is checked in comparison with the experimental data reported such as the secondary electron emission and backscattering yields from thick Al, thick Au targets and Al thin films on a Au substrate, the energy distribution of secondary electrons, and the contribution of backscattering to the secondary electron emission yield. The agreement is relatively good. Next, we have applied the model to the secondary electron emission from Au films on an Al substrate. It has been found from the calculated results of the spatial distribution of secondary electrons that the Au film coating increases the background intensity and deteriorates resolution in the secondary electron image formation.

Recommended Citation

Murata, K.; Yasuda, M.; and Kawata, H. (1996) "Monte Carlo Simulation of Secondary Electron Emission From Thin Film/Substrate Targets," Scanning Microscopy: Vol. 10: No. 3, Article 1.
Available at: https://digitalcommons.usu.edu/microscopy/vol10/iss3/1