A metrological electron microscope has been developed at the National Institute of Standards and Technology (NIST) traceable to national standards of length, and a new prototype magnification standard meeting the current needs of the scanning electron microscope (SEM) user community has been fabricated. This metrology instrument is designed to certify standards for the calibration of the magnification of the SEM and for the certification of artifacts for linewidth measurement done in the SEM. The artifacts will be useful for various applications in which the SEM is currently being used. The SEM-based metrology system is now operational at the Institute, and its design criteria and the progress on the characterization of the instrument are presented. The design and criteria for the new lithographically produced SEM low accelerating voltage magnification standard to be calibrated on this system are also discussed.
Postek, Michael T.
"Scanning Electron Microscope-based Metrological Electron Microscope System and New Prototype Scanning Electron Microscope Magnification Standard,"
Scanning Microscopy: Vol. 3
, Article 10.
Available at: https://digitalcommons.usu.edu/microscopy/vol3/iss4/10