An Analytical Method of Determining Thickness of Multi-Layer Films with Electron Microprobe

Authors

Yen-cai Ho, Shanghai Institute of Ceramics
Jia-guang Chen, Shanghai Baoshan Steel Works
Xin-lei Wang, Shanghai Institute of Ceramics

Abstract

In the previous work we have developed a series of theoretical corrections for calculating the emitted X-ray intensity in multi-layer films. By the use of these theories, along with careful experimental operation of the electron probe microanalysis (EPMA) and Monte Carlo iteration calculation, the thickness of each layer in multi-layer films can be determined.

To test the reliability of this method, the multi-layer film specimens Au/Cu/Si, Cu/Au/Si and Ag/Cr/Si of known thicknesses were analyzed at 20, 25, 30 and 35 keV. The percentage relative errors between the thicknesses determined using the correction procedures and those measured using nuclear backscattering are less than 10%, the average value of the errors is 4.6%.

The method may be extended to the calculations of determining element concentrations for the multi-layer specimens of known thicknesses.

Recommended Citation

Ho, Yen-cai; Chen, Jia-guang; and Wang, Xin-lei (1989) "An Analytical Method of Determining Thickness of Multi-Layer Films with Electron Microprobe," Scanning Microscopy: Vol. 3: No. 4, Article 3.
Available at: https://digitalcommons.usu.edu/microscopy/vol3/iss4/3