A Critical Analysis of Techniques and Basic Phenomena Related to Deposition of High Temperature Superconducting Thin Films

Authors

Orlando Auciello, North Carolina State University
Alan R. Krauss, Argonne National Laboratory
Angus I. Kingon, North Carolina State University
Michael S. Ameen, North Carolina State University

Abstract

The processes involved in plasma and ion beam sputter-, electron evaporation-, and laser ablation-deposition of high temperature superconducting thin films are critically reviewed. Recent advances in the development of these techniques are discussed in relation to basic physical phenomena, specific to each technique, which must be understood before high quality films can be produced. Low temperature processing of films is a common goal for each technique, particularly in relation to integrating high temperature superconducting films with the current microelectronics technology. Research is now demonstrating that the introduction of oxygen into the growing film, simultaneously with the deposition of the film components, is necessary to produce as-deposited superconducting films at relatively low substrate temperatures.

Recommended Citation

Auciello, Orlando; Krauss, Alan R.; Kingon, Angus I.; and Ameen, Michael S. (1990) "A Critical Analysis of Techniques and Basic Phenomena Related to Deposition of High Temperature Superconducting Thin Films," Scanning Microscopy: Vol. 4: No. 2, Article 1.
Available at: https://digitalcommons.usu.edu/microscopy/vol4/iss2/1