A New Approach to Low Temperature Embedding: Quick Freezing, Freeze-Drying and Direct Infiltration in Lowicryl K4M

Authors

R. Chiovetti, University of New Mexico
S. A. Little, University of New Mexico
J. Brass-Dale, University of New Mexico
L. J. McGuffee, University of New Mexico

Abstract

Lowicryl resins are most commonly used for low temperature embedding by progressively lowering the temperature during dehydration. Freeze-substitution has also been successfully used with Lowicryl, but both of these techniques generally rely on chemical fixation and prolonged incubations in organic solvents. Freeze-drying may be combined with embedding in Lowicryl K4M. This technique eliminates all chemical fixation and exposure to organic solvents since the samples are quick-frozen, dried in vacuo and directly infiltrated in pure Lowicryl resin. If a primary aldehyde fixation is desired, freeze-drying may be used as an alternative to dehydration with organic solvents. These new approaches may be of significance for histochemistry and immunohistochemistry.

Recommended Citation

Chiovetti, R.; Little, S. A.; Brass-Dale, J.; and McGuffee, L. J. (1985) "A New Approach to Low Temperature Embedding: Quick Freezing, Freeze-Drying and Direct Infiltration in Lowicryl K4M," Scanning Electron Microscopy: Vol. 4: No. 1, Article 17.
Available at: https://digitalcommons.usu.edu/electron/vol4/iss1/17