Metal silicide patterning: a new approach to silicon nanoelectronics

Authors

J. R. Tucker
C. Wang
T. C. Shen, Utah State UniversityFollow

Document Type

Article

Journal/Book Title/Conference

Nanotechnology

Issue

7

Publication Date

1996

First Page

275

Recommended Citation

J. R. Tucker, C. Wang and T.-C. Shen,"Metal silicide patterning: a new approach to silicon nanoelectronics," Nanotechnology 7, 275 (1996).

https://doi.org/10.1088/0957-4484/7/3/018