Monte Carlo Calculations for Electron Microscopy, Microanalysis, and Microlithography

Authors

David F. Kyser, IBM Research Laboratory

Abstract

The methodology of Monte Carlo simulation for electron scattering and energy dissipation in solid targets is reviewed. The basic concepts of single and multiple elastic scattering models are compared, and the continuous energy loss model for inelastic scattering is discussed. Some new developments in Monte Carlo simulation are reviewed, including improvements in the elastic scattering model and discrete models for inelastic scattering. A variety of practical applications of Monte Carlo calculations in the fields of electron microscopy, electron probe microanalysis, and electron beam lithography are reviewed. The Monte Carlo computer program listings available in the literature are also described.

Recommended Citation

Kyser, David F. (1982) "Monte Carlo Calculations for Electron Microscopy, Microanalysis, and Microlithography," Scanning Electron Microscopy: Vol. 1982: No. 1, Article 10.
Available at: https://digitalcommons.usu.edu/electron/vol1982/iss1/10