Single crystal manganese-zinc (MnO,ZnO.Fe2O3) ferrite wafers with a 50 Angstrom surface finish were subjected to a conventional cleaning procedure and then analyzed in a JAMP-10 Auger microprobe with an internal heating device. Three essential Auger peaks were monitored during the heating. Auger peak intensity vs. time profiles were obtained for the heating process. High vacuum heat treatment conditions were established for the preparation of these materials for use as substrates in UHV thin film growth.
Bisagni, Christine and Veisfeld, Nina
"Auger Microprobe Temperature Profiles of Contamination Residue on Single Crystal Ferrite Substrates,"
Scanning Electron Microscopy: Vol. 1986
, Article 10.
Available at: https://digitalcommons.usu.edu/electron/vol1986/iss2/10