Calculation of a Topographic Contrast in the Scanning Electron Microscope

Authors

M. Kotera, Osaka Institute of Technology
T. Fujiwara, Osaka Institute of Technology
S. Yamaguchi, Osaka Institute of Technology
H. Suga, Osaka Institute of Technology

Abstract

A direct simulation of electron scattering in solids is developed. Using this simulation, a topographic contrast found in the scanning electron microscope is quantitatively discussed. The surface topography studied here is a rectangular rod pattern and a rectangular groove pattern at an infinite horizontal plane surface of Al. We quantify characteristics of the secondary electron image and of the backscattered electron image at the topography. The intensity profile at the bottom surface of the groove pattern is roughly approximated by an analytical model.

Recommended Citation

Kotera, M.; Fujiwara, T.; Yamaguchi, S.; and Suga, H. (1993) "Calculation of a Topographic Contrast in the Scanning Electron Microscope," Scanning Microscopy: Vol. 7: No. 2, Article 11.
Available at: https://digitalcommons.usu.edu/microscopy/vol7/iss2/11