Mentor
T.-C. Shen
Document Type
Article
Publisher
Utah State University
Publication Date
5-2021
First Page
1
Last Page
16
Abstract
At the Nanoscale Device Laboratory, we can routinely create patterns with a minimum linewidth of 800 nm using photolithography. However, to create photonic devices, the pattern size must be smaller than the wavelength of visible light (400 to 800 nm). Dedicated electron beam writers can achieve a sub-10 nm linewidth, but this system is beyond our reach. In this project, we plan to use a Nanometer Pattern Generation System connected to a Quanta 650 scanning electron microscope to perform e-beam lithography. After setting up a computer to run the NPGS system, and establishing communications with the SEM, we experimented with electron doses and developing times to achieve patterns with a 50 nm linewidth.
Recommended Citation
Pašić, Din, "Developing Electron Beam Lithography at Nanoscale Device Laboratory" (2021). Physics Capstone Projects. Paper 96.
https://digitalcommons.usu.edu/phys_capstoneproject/96