
All Physics Faculty Publications
Title
Preparation of atomically clean and flat Si(100) surfaces by low-energy ion sputtering and low-temperature annealing
Document Type
Article
Journal/Book Title/Conference
Applied Surface Science
Issue
220
Publication Date
2003
Recommended Citation
J. C. Kim, J.-Y. Ji, J. S. Kline, J. R. Tucker, and T.-C. Shen, “Preparation of atomically clean and flat Si(100) surfaces by low-energy ion sputtering and low-temperature annealing,” Appl. Surf. Sci. 220, 293 (2003).