Document Type
Article
Journal/Book Title/Conference
Rev. Sci. Instrum.
Volume
63
Location
3835-3841
Publication Date
1992
Abstract
An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables in situ characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag( 111) surface.
Recommended Citation
Dennison, JR; Wang, S. K.; and Ehrlich, S. N., "Ultrahigh Vacuum Chamber for Synchrotron X-ray Diffraction from Films Adsorbed on Single-crystal Surfaces" (1992). Journal Articles. Paper 25.
https://digitalcommons.usu.edu/mp_facpub/25
