The initial stage of nucleation and growth of Al on H/Si(100)-1x1 by dimethylaluminum hydride vapor deposition

Authors

T. C. Shen, Utah State UniversityFollow
C. Wang
J. R. Tucker

Document Type

Article

Journal/Book Title/Conference

Applied Surface Science

Issue

141

Publication Date

1999

First Page

228

Last Page

236

Recommended Citation

T.-C. Shen, C. Wang, and J. R. Tucker,” The initial stage of nucleation and growth of Al on H/Si(100)-1x1 by dimethylaluminum hydride vapor deposition,” Appl. Surf. Sci. 141, 228-236 (1999).

https://doi.org/10.1016/S0169-4332(98)00509-1