Preparation of atomically flat Si(100) surface by ion etching

Authors

J. Kim
J. -Y. Ji
T. C. Shen, Utah State UniversityFollow
J. S. Kline
J. R. Tucker

Document Type

Presentation

Publication Date

11-7-2002

Recommended Citation

Talk at 49th International Symposium of AVS, Denver, Colorado, 11/7/2002. “Preparation of atomically flat Si(100) surface by ion etching,” presented by J. Kim, J.-Y. Ji, T.-C. Shen, J. S. Kline, J. R. Tucker