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Preparation of atomically flat Si(100) surface by ion etching
Document Type
Presentation
Publication Date
11-7-2002
Recommended Citation
Talk at 49th International Symposium of AVS, Denver, Colorado, 11/7/2002. “Preparation of atomically flat Si(100) surface by ion etching,” presented by J. Kim, J.-Y. Ji, T.-C. Shen, J. S. Kline, J. R. Tucker