
All Physics Faculty Publications
Title
The initial stage of nucleation and growth of Al on H/Si(100)-1x1 by dimethylaluminum hydride vapor deposition
Document Type
Article
Journal/Book Title/Conference
Applied Surface Science
Issue
141
Publication Date
1999
First Page
228
Last Page
236
Recommended Citation
T.-C. Shen, C. Wang, and J. R. Tucker,” The initial stage of nucleation and growth of Al on H/Si(100)-1x1 by dimethylaluminum hydride vapor deposition,” Appl. Surf. Sci. 141, 228-236 (1999).