The Effect of Low Energy Electron and UV/VIS Radiation Aging on the Electron Emission Properties and Breakdown of Thin-film Dielectrics

Authors

John R. Dennison, Utah State UniversityFollow
C. D. Thomson
Alec Sim, Utah State UniversityFollow

Document Type

Article

Journal/Book Title/Conference

Proceedings of the 8th IEEE Dielectrics and Electrical Insulation Society (DEIS) International Conference on Solid Dielectrics (ICSD)

Volume

2

Publisher

IEEE

Publication Date

11-1-2004

First Page

967

Last Page

971

Abstract

Studies of secondary and backscattered electron yield curves of thin-film dielectrics have recently been made using pulsed, low current electron beam methods to minimize insulator charging. These capabilities have allowed us to investigate the evolution of surface and internal charge profiles as a function of low energy electron (keV) pulsed-electron fluence to determine how quickly insulators charge, and how this can affect subsequent electron emission properties. We have also studied critical incident electron energies that result in electrical breakdown of insulator materials and the effect of breakdown on subsequent emission, charging and conduction. The qualitative physics of such processes in solid dielectrics has long been known; this work begins to place such studies on a quantitative basis.

Comments

Author's post print is available for download from link above.

Published by IEEE in Proceedings of the IEEE.

Recommended Citation

Dennison, JR.; Thomson, C.D.; Sim, A.M.; , "The effect of low energy electron and UV/VIS radiation aging on the electron emission properties and breakdown of thin-film dielectrics," Solid Dielectrics, 2004. ICSD 2004. Proceedings of the 2004 IEEE International Conference on , vol.2, no., pp. 967- 971 Vol.2, 5-9 July 2004 doi: 10.1109/ICSD.2004.1350593