Class
Article
College
College of Science
Department
Physics Department
Faculty Mentor
T.-C. Shen
Presentation Type
Poster Presentation
Abstract
At the Nanoscale Device Laboratory, we can routinely create patterns with a minimum linewidth of 800 nm using photolithography. However, to create photonic devices, the pattern size must be smaller than the wavelength of visible light (400 to 800 nm). Dedicated electron beam writers can achieve a sub-10 nm linewidth, but this system is beyond our reach. In this project, we plan to use a Nanometer Pattern Generation System (NPGS) connected to a Quanta 650 scanning electron microscope (SEM) to perform e-beam lithography. After setting up a computer to run the NPGS system, and establishing communications with the SEM, we will experiment with electron doses and developing times to achieve patterns with a 50 nm linewidth.
Location
Logan, UT
Start Date
4-13-2021 12:00 AM
Included in
Developing Electron Beam Lithography at Nanoscale Device Laboratory
Logan, UT
At the Nanoscale Device Laboratory, we can routinely create patterns with a minimum linewidth of 800 nm using photolithography. However, to create photonic devices, the pattern size must be smaller than the wavelength of visible light (400 to 800 nm). Dedicated electron beam writers can achieve a sub-10 nm linewidth, but this system is beyond our reach. In this project, we plan to use a Nanometer Pattern Generation System (NPGS) connected to a Quanta 650 scanning electron microscope (SEM) to perform e-beam lithography. After setting up a computer to run the NPGS system, and establishing communications with the SEM, we will experiment with electron doses and developing times to achieve patterns with a 50 nm linewidth.