A Novel Technique for the Simultaneous Collection of Reflection and Transmission Data from Thin Films in the Extreme Ultraviolet

Salt Lake Community College

Studies of thin films in the Extreme Ultraviolet (EUV) are difficult given that most materials readily absorb photons of these energies. By depositing a thin film of the material of interest on a silicon photodiode, transmission measurements can be made throughout the EUV. If the measurements are made in a range of low absorption, the extinction coefficient, k, can be found with relative ease. However, if the material’s absorption is considerable, reflection measurements are needed to supplement the transmission data in order to find the optical constants n and k. The technique developed allows for reflection and transmission measurements to be taken simultaneously, which combined, account for all of the measurable photons from the original beam: (those which cannot be counted are photons absorbed into the thin film material). Also, the technique presented allows for data to be collected from practically all angles of incidence. This technique has been applied to a thin film of scandium oxide (d=65 nm), with measurements taken over wavelengths from 2.5-25 nm, and at angles of incidence 12 degrees from grazing to normal.